Ti film deposition process of a plasma focus: Study by an experimental design
Cargando...
Archivos
Fecha
2017-10
Profesor/a Guía
Facultad/escuela
Idioma
en
Título de la revista
ISSN de la revista
Título del volumen
Editor
American Institute of Physics Inc.
Nombre de Curso
Licencia CC
Licencia CC
Resumen
The plasma generated by plasma focus (PF) devices have substantially different physical characteristics from another plasma, energetic ions and electrons, compared with conventional plasma devices used for plasma nanofabrication, offering new and unique opportunities in the processing and synthesis of Nanomaterials. This article presents the use of a plasma focus of tens of joules, PF-50J, for the deposition of materials sprayed from the anode by the plasma dynamics in the axial direction. This work focuses on the determination of the most significant effects of the technological parameters of the system on the obtained depositions through the use of a statistical experimental design. The results allow us to give a qualitative understanding of the Ti film deposition process in our PF device depending on four different events provoked by the plasma dynamics: i) an electric erosion of the outer material of the anode; ii) substrate ablation generating an interlayer; iii) electron beam deposition of material from the center of the anode; iv) heat load provoking clustering or even melting of the deposition surface.
Notas
Indexación: Scopus
Palabras clave
Titanium, Anodes, Dynamics, Magnetohydrodynamics, Plasma devices, Plasma diagnostics, Statistics
Citación
AIP Advances, 7(10), art. no. 105026.