Examinando por Autor "Soto L."

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    In vitro irradiation of colorectal cancer cells by pulsed radiation emitted from a hundred joules plasma focus device and its comparison with continuous irradiation
    (Institute of Physics Publishing, 2018-06) Jain J.; Moreno J.; Andaur R.; Armisen R.; Avaria G.; Bora B.; Davis S.; Pavez C.; Marcelain K.; Soto L.
    In the last years, pulsed reduced low dose radiation has been proposed as an alternative for treatment of recurrent cancer. Nonetheless, distinction between the effects of low dose pulsed and continuous radiation is barely known at cellular level. In order to study the effects of low dose pulsed radiation at cellular level, in vitro experiments are important to further advance the basic understanding in this area. In the present work we demonstrate the usefulness of a low-energy plasma focus device PF-400J as a potential source of low-dose pulsed radiation for in vitro cancer cell experiments. Colorectal cancer cell line, DLD-1, were irradiated by pulsed x-rays. Fifty pulses of x-rays provide ∼0.12 Gy dosis, which were measured using thermoluminescence detectors (TLD-100 dosimeters). Irradiation-induced DNA damage was assessed at different time points after irradiation. A statistically significant double strand break (DSB) DNA damage was observed at 30 minutes after irradiation. A comparison of DSB induced by continuous source in the same type cancer cells and pulsed irradiation is made at 30 minutes post-irradiation. In the case of pulsed irradiation, DSB per unit dose found higher. Our findings suggest that low-energy plasma focus devices could have potential application as pulsed radiation source in the area of in vitro cancer cell experiments. © Published under licence by IOP Publishing Ltd.
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    Ti film deposition process of a plasma focus: Study by an experimental design
    (American Institute of Physics Inc., 2017-10) Inestrosa-Izurieta M.J.; Moreno J.; Davis S.; Soto L.
    The plasma generated by plasma focus (PF) devices have substantially different physical characteristics from another plasma, energetic ions and electrons, compared with conventional plasma devices used for plasma nanofabrication, offering new and unique opportunities in the processing and synthesis of Nanomaterials. This article presents the use of a plasma focus of tens of joules, PF-50J, for the deposition of materials sprayed from the anode by the plasma dynamics in the axial direction. This work focuses on the determination of the most significant effects of the technological parameters of the system on the obtained depositions through the use of a statistical experimental design. The results allow us to give a qualitative understanding of the Ti film deposition process in our PF device depending on four different events provoked by the plasma dynamics: i) an electric erosion of the outer material of the anode; ii) substrate ablation generating an interlayer; iii) electron beam deposition of material from the center of the anode; iv) heat load provoking clustering or even melting of the deposition surface. © 2017 Author(s).