Gelation of n3p3[nh(ch2)3si(oet)3]6-n [x]n x = nh(ch2)3si(oet)3, nch3(ch2)3cn and oc6h4(ch2)cn, n = 0 or 3 at the liquid/air/interface

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dc.contributor.authorDíaz, Carlos
dc.contributor.authorValenzuela, María Luisa
dc.contributor.authorYutronic, Nicolás
dc.contributor.authorAguirre, Pedro
dc.date.accessioned2013-10-22T18:50:38Z
dc.date.accessioned2016-05-24T20:23:10Z
dc.date.available2013-10-22T18:50:38Z
dc.date.available2016-05-24T20:23:10Z
dc.date.issued2010
dc.descriptionIndexación: Scielo
dc.description.abstractThe compounds N3P3[NH(CH2)3Si(OEt)3]6 (1), N3P3[NH(CH2)3Si(OEt)3]3[NCH3(CH2)3CN]3 (2) and N3P3[NH(CH2)3Si(OEt)3]3 [HOC6H4(CH2)CN]3 (3) undergo slow gelation at the interface oil/air at low temperatures to give perfect gels G1, G2 and G3 respective ly. TEM analysis reveals nanoparticles of silica with mean size of about 10 nm. Pyrolysis under air at 800 °C of these gels affords a mixture of mainly Si5(PO4)6O, SiP2O7 and SiO2. Gelation and pyrolysis products were characterized by IR, solid-state NMR, TEM, SEM-EDAX microscopy and X-ray diffraction. The sol-gel process in the interface liquid /air is discussed in comparison with the usual sol-gel solution process.en
dc.description.urihttp://www.scielo.cl/scielo.php?script=sci_arttext&pid=S0717-97072010000300031&nrm=iso
dc.identifier.citationRevista de la Sociedad Química de Chile, Vol. 55, N° 3, pp. 415-418, 2010.
dc.identifier.issnISSN: 0717-9707
dc.identifier.otherDOI: 10.4067/S0717-97072010000300031
dc.identifier.urihttp://repositorio.unab.cl/xmlui/handle/ria/1947
dc.language.isoen
dc.publisherSociedad Chilena de Química
dc.rights.holder© 2013 Sociedad Chilena de Química
dc.subjectSol-gel
dc.subjectCyclotriphosphazenes
dc.subjectNanostructure materials
dc.subjectSilica nanoparticles
dc.subjectPhosphazenes
dc.titleGelation of n3p3[nh(ch2)3si(oet)3]6-n [x]n x = nh(ch2)3si(oet)3, nch3(ch2)3cn and oc6h4(ch2)cn, n = 0 or 3 at the liquid/air/interface
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