Ti film deposition process of a plasma focus: Study by an experimental design

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dc.contributor.authorInestrosa-Izurieta, M.J.
dc.contributor.authorMoreno, J.
dc.contributor.authorDavis, S.
dc.contributor.authorSoto, L.
dc.date.accessioned2018-04-30T21:00:18Z
dc.date.available2018-04-30T21:00:18Z
dc.date.issued2017-10
dc.descriptionIndexación: Scopuses_ES
dc.description.abstractThe plasma generated by plasma focus (PF) devices have substantially different physical characteristics from another plasma, energetic ions and electrons, compared with conventional plasma devices used for plasma nanofabrication, offering new and unique opportunities in the processing and synthesis of Nanomaterials. This article presents the use of a plasma focus of tens of joules, PF-50J, for the deposition of materials sprayed from the anode by the plasma dynamics in the axial direction. This work focuses on the determination of the most significant effects of the technological parameters of the system on the obtained depositions through the use of a statistical experimental design. The results allow us to give a qualitative understanding of the Ti film deposition process in our PF device depending on four different events provoked by the plasma dynamics: i) an electric erosion of the outer material of the anode; ii) substrate ablation generating an interlayer; iii) electron beam deposition of material from the center of the anode; iv) heat load provoking clustering or even melting of the deposition surface.es_ES
dc.description.urihttps://aip.scitation.org/doi/pdf/10.1063/1.4997877
dc.identifier.citationAIP Advances, 7(10), art. no. 105026.es_ES
dc.identifier.issn2158-3226
dc.identifier.otherDOI: 10.1063/1.4997877
dc.identifier.urihttp://repositorio.unab.cl/xmlui/handle/ria/5689
dc.language.isoenes_ES
dc.publisherAmerican Institute of Physics Inc.es_ES
dc.subjectTitaniumes_ES
dc.subjectAnodeses_ES
dc.subjectDynamicses_ES
dc.subjectMagnetohydrodynamicses_ES
dc.subjectPlasma deviceses_ES
dc.subjectPlasma diagnosticses_ES
dc.subjectStatisticses_ES
dc.titleTi film deposition process of a plasma focus: Study by an experimental designes_ES
dc.typeArtículoes_ES
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